Vacuum Manual / edited by L. Holland, W. Steckelmacher, J. Yarwood

Steckelmacher, W. [editor.] ; Yarwood, J. [editor.]

Englisch

Dordrecht : Springer Netherlands, 1974

Online-Ressource : online resource

Erscheint auch als (Druck-Ausgabe) : ISBN 9789401181228

Erscheint auch als (Druck-Ausgabe) : ISBN 9780419107408

Erscheint auch als (Druck-Ausgabe) : ISBN 9789401181211

978-94-011-8120-4

Weitere Ausgaben: 978-94-011-8122-8 (Druckausgabe)

DOI: 10.1007/978-94-011-8120-4

1. Basic Data1.1 Ultimate pressure(pu) -- 1.2 Evolution of gas from materials -- 1.3 Permeation of gases through solids -- 1.4 Gas flow in vacuum systems -- 1.5 Pump fluids, sealing compounds and greases -- References -- 2. Vacuum Equipment -- 2.1 Vacuum pumps, valves and accessories -- 2.2 Vacuum instrumentation -- 2.3 Vacuum process plant and vacuum systems -- 2.4 Manufacturers’ names and addresses -- 3. Recent Developments in Vacuum Science and Technology -- 3.1 Vacuum pumps; recent developments -- References -- 3.2 Vacuum instruments for the analysis of surfaces -- References -- 3.3 Ion impact sputtering: particle emission related to apparatus design and thin film growth -- References -- Manufacturers’ Index -- Equipment Index -- Advertisers’ Index.

*Science (General) ; Social sciences. ; Humanities.

Klassifikation der Library of Congress: Q1-390

Dewey Dezimal-Klassifikation: 50; ; 300; ; 001.3;

Book Industry Communication: GT

bisacsh: SCI000000

1. Basic Data -- 1.1 Ultimate pressure(pu) -- 1.2 Evolution of gas from materials -- 1.3 Permeation of gases through solids -- 1.4 Gas flow in vacuum systems -- 1.5 Pump fluids, sealing compounds and greases -- References -- 2. Vacuum Equipment -- 2.1 Vacuum pumps, valves and accessories -- 2.2 Vacuum instrumentation -- 2.3 Vacuum process plant and vacuum systems -- 2.4 Manufacturers’ names and addresses -- 3. Recent Developments in Vacuum Science and Technology -- 3.1 Vacuum pumps; recent developments -- References -- 3.2 Vacuum instruments for the analysis of surfaces -- References -- 3.3 Ion impact sputtering: particle emission related to apparatus design and thin film growth -- References -- Manufacturers’ Index -- Equipment Index -- Advertisers’ Index.

Vacuum apparatus is widely used in research and industrial establishments for providing and monitoring the working environments required for the operation of many kinds of scientific instruments and process plant. The vacuum conditions needed range from the relatively coarse vacuum requirements in applications covering diverse fields such as food packaging, dentistry (investment casting), vacuum forming, vacuum metallur­ gical processes, vacuum impregnation, molecular distillation, vacuum drying and freeze drying etc. to the other extreme involving the highest possible vacuum as in particle accelerators, space technology -both in simulation and outer space, and research studies of atomically clean surfaces and pure condensed metal films. Vacua commence with the rough vacuum region, i.e. from atmosphere to 100 Pa * passing 6 through medium vacuum of 100 Pa to 0·1 Pa and high vacuum of 0·1 Pa to 1 J.lPa (10- Pa) until ultra high vacuum is reached below 1 J.lPa to the limit of measurable pressure about 12 I pPa (10- Pa).

 

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http://dx.doi.org/10.1007/978-94-011-8120-4 [Springer EBook]